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Seminario "A triple ion beam system: what are the benefits of FIB milling with He, Ne or Ga ions"

Pubblicato: Venerdì 12 maggio 2017 da Paolo Olivero

"A triple ion beam system: what are the benefits of FIB milling with He, Ne or Ga ions"

Babs Fairchild

RMIT University

Wednesday, 17 May 2017, h. 15:30 

Sala Wataghin, Physics Department, via P. Giuria 1, Torino

Focused ion beam milling with 30 keV gallium ions has been an industry standard for many years.  The development of helium and neon ion beam imaging and milling systems has pushed this field into a new area of development.  I will discuss the pro's and con's of this system as well as detailing some of the aspects of operation of the Zeiss NanoFab tool.

Ultimo aggiornamento: 12/05/2017 11:30
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